2025年3月19日
I. Stringent Water Quality Requirements in Chip Manufacturing As the "crown jewel" of modern industry, chip production involves complex and time-consuming processes. From wafer arrival to final packaging and testing...
2023年11月20日
1. Principle of Forward Osmosis (FO) A semi-permeable membrane, which allows solvent molecules to pass through but blocks solute molecules, separates the solvent and solution. Under osmotic pressure, solvent molecules spontaneously...
2023年3月29日
河南(nan)心(xin)(xin)(xin)連(lian)心(xin)(xin)(xin)化(hua)肥除鹽(yan)水(shui)項(xiang)目(mu) 時間:2019年項(xiang)目(mu)名稱:河南(nan)心(xin)(xin)(xin)連(lian)心(xin)(xin)(xin)產(chan)業升級(ji)項(xiang)目(mu)脫鹽(yan)水(shui)站項(xiang)目(mu)地點:河南(nan)省(sheng)新鄉(xiang)市項(xiang)目(mu)規模:27000噸/天主要(yao)工藝:超濾(lv)+一級(ji)反滲(shen)透+二級(ji)反滲(shen)透+EDI 蘇州蘇爾(er)科(ke)環保工程有(you)限公司為您提供各(ge)類廢(fei)水(shui)處(chu)理和(he)中水(shui)回用等(deng)解決方案,為...
2023年3月8日
EDI電(dian)去離(li)子(zi)設備一(yi)般(ban)以(yi)反滲透(RO)純(chun)水(shui)(shui)作為EDI給水(shui)(shui)。RO純(chun)水(shui)(shui)電(dian)導率一(yi)般(ban)是(shi)40-2μS/cm(25℃)。EDI純(chun)水(shui)(shui)電(dian)阻率可(ke)以(yi)高達15MΩ.cm(25℃),但是(shi)根(gen)據(ju)去離(li)子(zi)水(shui)(shui)用途和系統工藝、配置不(bu)同,EDI純(chun)水(shui)(shui)適(shi)用于制(zhi)備電(dian)阻率要求在1-18.2MΩ.cm(25℃)的超(chao)純(chun)水(shui)(shui)。 EDI電(dian)去離(li)...