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Home » Electrodeionization device
Ultrapure Water Systems | Membrane Tech Integration Empowering Semiconductor High-End Manufacturing
2025年3月19日
I. Stringent Water Quality Requirements in Chip Manufacturing As the "crown jewel" of modern industry, chip production involves complex and time-consuming processes. From wafer arrival to final packaging and testing...
?Membrane Technology in Water Treatment Applications
2023年11月20日
1. Principle of Forward Osmosis (FO) A semi-permeable membrane, which allows solvent molecules to pass through but blocks solute molecules, separates the solvent and solution. Under osmotic pressure, solvent molecules spontaneously...
Atotech Yangzhou Launches 70,000-Ton Electronic Chemical Additives Project: Phase I Ultrapure Water System & Auxiliary Facilities
2023年3月29日
安美特(揚州(zhou))化(hua)學(xue)(xue)有限公司年(nian)產7萬(wan)噸電(dian)子化(hua)學(xue)(xue)品(pin)助劑項(xiang)目(mu)(mu)(mu)一期(qi)工(gong)(gong)程(cheng)純水及(ji)配套設(she)備(bei)工(gong)(gong)程(cheng) 時間：2018年(nian)項(xiang)目(mu)(mu)(mu)名稱：安美特(揚州(zhou))化(hua)學(xue)(xue)有限公司年(nian)產7萬(wan)噸電(dian)子化(hua)學(xue)(xue)品(pin)助劑項(xiang)目(mu)(mu)(mu)一期(qi)工(gong)(gong)程(cheng)純水及(ji)配套設(she)備(bei)工(gong)(gong)程(cheng)項(xiang)目(mu)(mu)(mu)地點：江蘇省揚州(zhou)市揚州(zhou)化(hua)學(xue)(xue)工(gong)(gong)業園區項(xiang)目(mu)(mu)(mu)規模(mo)：15噸/小(xiao)...
Henan Xinlianxin Fertilizer Demineralized Water Project
2023年3月29日
河(he)南(nan)心(xin)(xin)連(lian)(lian)心(xin)(xin)化肥除鹽水(shui)項(xiang)目(mu) 時間(jian)：2019年項(xiang)目(mu)名(ming)稱：河(he)南(nan)心(xin)(xin)連(lian)(lian)心(xin)(xin)產業升級(ji)項(xiang)目(mu)脫鹽水(shui)站項(xiang)目(mu)地點：河(he)南(nan)省新鄉(xiang)市項(xiang)目(mu)規(gui)模：27000噸/天主要(yao)工藝：超濾+一級(ji)反(fan)滲透+二級(ji)反(fan)滲透+EDI 蘇州(zhou)蘇爾(er)科環(huan)保工程有(you)限公司為您提(ti)供(gong)各類廢水(shui)處理和中水(shui)回用(yong)等(deng)解決(jue)方案(an)，為...
Electrodeionization device
2023年3月8日
EDI電(dian)(dian)去(qu)離(li)子(zi)設(she)備(bei)一(yi)般(ban)以反滲透(tou)（RO）純(chun)水(shui)作為EDI給水(shui)。RO純(chun)水(shui)電(dian)(dian)導率(lv)(lv)(lv)一(yi)般(ban)是40-2μS/cm（25℃）。EDI純(chun)水(shui)電(dian)(dian)阻(zu)率(lv)(lv)(lv)可以高達15MΩ.cm(25℃)，但是根據去(qu)離(li)子(zi)水(shui)用途(tu)和系統工藝、配置不同，EDI純(chun)水(shui)適用于制備(bei)電(dian)(dian)阻(zu)率(lv)(lv)(lv)要求在1-18.2MΩ.cm(25℃)的超純(chun)水(shui)。 EDI電(dian)(dian)去(qu)離(li)...
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